Direct Nanopatterning of Metal Surfaces Using Self‐Assembled Molecular Films

Abstract

A new method for direct patterning of metal surfaces with sub‐50 nm resolution based on molecular films is described (see Figure). Thermal vapor deposition of different metals on chemically surface‐modified nanostructured silicon or metallic masters allows direct pattern transfer and easy film detachment. Patterned metallic surfaces are also used as platforms to grow nanostructured hybrid materials by controlled chemical reactions.