Applied Physics Letters · 2002 · 245 citations · 17 references
EngineeringMultiferroicsFerroelectric ApplicationNanoelectronicsSize EffectDry EtchingPiezoelectric MaterialThin Film ProcessingMaterials ScienceMaterials EngineeringElectrical EngineeringEpitaxial 200Piezoelectric ResponseDecreasing Feature SizePiezoelectricityMicroelectronicsFerroelasticsSurface ScienceApplied PhysicsCondensed Matter Physics
An epitaxial 200 nm thick film of Pb(Zr0.40Ti0.60)O3 (PZT) has been deposited by reactive rf magnetron sputtering on conductive Nb-doped SrTiO3 (100) (STO). The patterning process involved electron-beam lithography of polymethylmethacrylate, fabrication of a 75 nm thick Cr hard mask layer by means of a lift-off process, and dry etching of PZT. The smallest PZT features obtained were 100 nm in lateral dimensions. Piezoelectric sensitive scanning force microscopy in the contact mode revealed a strong increase of the piezoelectric response for feature sizes with lateral dimensions below 300 nm. It is proposed that this behavior is mainly due to vanishing a domains.
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Equilibrium structure of epitaxial layers
A. L. Roǐtburd · physica status solidi (a) · 1976 · 319 citations
Engineering, Multiscale Mechanics, Epitaxial Stress Relief +19
C. M. Foster, G. R. Bai, R. Csencsits et al. · Journal of Applied Physics · 1997 · 277 citations
Materials Science, Oxide Heterostructures, Optical Materials +14