Method of surface treatment on sapphire substrate

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

CMP of hard disk substrate using a colloidal SiO2 slurry: preliminary experimental investigation

Hong Lei, Jianbin Luo · Wear · 2004 · 134 citations

Natural Sciences, Materials Engineering, Materials Science +10

GaN growth on sapphire

W. Melton, J. I. Pánkové · Journal of Crystal Growth · 1997 · 106 citations

Engineering, Materials Engineering, Semiconductor Devices +7

Effect of process parameters on material removal rate in chemical mechanical polishing of Si(100)

Markus Forsberg · Microelectronic Engineering · 2004 · 77 citations

Engineering, Materials Engineering, Materials Science +16

ICP etching of sapphire substrates

Y.P. Hsu, S. J. Chang, Yan Su et al. · Optical Materials · 2004 · 61 citations

Natural Sciences, Materials Engineering, Materials Science +14