Thickness dependence of the structural and electrical properties of copper films deposited by dc magnetron sputtering technique

Surface and Coatings Technology

Elsevier Sdol · 2009 · 516 citations

Natural Sciences, Materials Engineering, Materials Science +12

Mechanisms for microstructure evolution in electroplated copper thin films near room temperature

J. M. E. Harper, C. Cabral, P. C. Andricacos et al. · Journal of Applied Physics · 1999 · 359 citations

Natural Sciences, Materials Engineering, Materials Science +17

A quantitative model for the evolution from random orientation to a unique texture in PVD thin film growth

G. Knuyt, C. Quaeyhaegens, Jan D’Haen et al. · Thin Solid Films · 1995 · 135 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effects of deposition parameters on the crystallinity of CeO2 thin films deposited on Si(100) substrates by r.f.-magnetron sputtering

Leejun Kim, Jinmo Kim, Donggeun Jung et al. · Thin Solid Films · 2000 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +15

Studies on the effect of substrate temperature on (VI–VI) textured tungsten oxide (WO3) thin films on glass, SnO2:F substrates by PVD:EBE technique for electrochromic devices

R. Sivakumar, M. Jayachandran, C. Sanjeeviraja · Materials Chemistry and Physics · 2004 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +17