Control ability of spin coating planarization of resist filmand optimal control of developers

A mathematical model for spin coating of polymer resists

Warren W. Flack, David S. Soong, Alexis T. Bell et al. · Journal of Applied Physics · 1984 · 249 citations

Natural Sciences, Materials Engineering, Materials Science +17

Analytical expression for the standing wave intensity in photoresist

Chris A. Mack · Applied Optics · 1986 · 62 citations

Natural Sciences, Materials Science, Physics +13

Quantitative Evaluation of Photoresist Patterns in the 1-μm Range

Dietrich Widmann · Applied Optics · 1975 · 19 citations

Engineering, Electrical Engineering, Materials Science +13

Standing Waves in Photoresists

J. E. Korka · Applied Optics · 1970 · 15 citations

Natural Sciences, Communication, Optics +3