Influence of argon dilution on the growth of amorphous to ultra nanocrystalline silicon films using VHF PECVD process

Jhuma Gope, Sushil Kumar, Kalpana Lodhi, C. M. S. Rauthan, Pankaj Srivastava

Journal of Alloys and Compounds · 2013 · 18 citations · 23 references

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