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Microwave ion source for high-current implanter
56
Citations
4
References
1978
Year
Electrical EngineeringEnergy HarvestingEngineeringIon ImplantationIon BeamPulse PowerMicrowave Ion SourceGas Discharge PlasmaWireless Implantable DeviceMicrowave EngineeringIon EmissionElectromagnetic Mass Separator
A long-life, high-current, microwave ion source for an electromagnetic mass separator is described. Ionization takes place due to the 2.45-GHz microwave discharge at a magnetic field intensity which is higher than the electron cyclotron resonance magnetic field. The discharge chamber is a ridged circular waveguide. The discharge region is restricted to a rectangular volume between the ridged electrodes by filling the remaining portions with dielectric. This source operates under low pressure (10(-2)-10(-3) Torr) and with high power efficiency. The incident microwave power is only several hundred watts at maximum output. When PH(3) gas is introduced, the total extracted current is about 40 mA with a 2x40-mm extraction slit. A P(+) ion implantation current of more than 10 mA is obtained by combining the source with a 40-cm radius, 60 degrees deflection magnetic mass separator.
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