Niobium silicide formation induced by Ar-ion bombardment

Abstract

The effect of Ar-ion bombardment on evaporated–Nb-on-Si systems has been investigated with He backscattering and x-ray-diffraction measurements. High-dose bombardment with energetic Ar ions was found to induce intermixing between Nb and Si in the form of NbSi2. This effect has strong dependence on temperature during bombardment, although it cannot be explained as enhanced diffusion due to radiation damage or ion-beam heating.