Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 27 citations · 12 references
Natural SciencesMaterials EngineeringMaterials SciencePolymer ChemistryPolymer EngineeringPolymer MaterialsAtomic Force MicroscopyPolymer CharacterizationPolymer Phase BehaviorPolymer Physical ChemistryPolymer Thin FilmsSurface RoughnessAtomic Force Microscopy AnalysisAtomic Force Microscopy RoughnessDeveloper ChemistryPolymer Phase SeparationPolymer Phase Separation KineticsPolymer SeparationResist DevelopmentSolvent Content Effects
The dependence of roughness of poly(methylmethacrylate) resist features on developer composition and development time, using methyl isobutyl ketone:propanol (MIBK:IPA) developer with and without ultrasonic assistance, is investigated using atomic force microscopy. It is found that the roughness decreases with increasing proportion of MIBK in the developer and that for a weak developer (1:4 MIBK:IPA at 25 °C), the roughness increases with development time. Ultrasonically assisted development is also found to reduce the roughness when using a weak developer, but has no significant effect with a strong developer (1:1 MIBK:IPA), or when using 3:7 water:IPA. We propose that the origin of the roughness is due to phase separation during development in weak solvents and for long development times.
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Nano edge roughness in polymer resist patterns
Toshiyuki Yoshimura, Hiroshi Shiraishi, Jiro Yamamoto et al. · Applied Physics Letters · 1993 · 89 citations
Surface roughness development during photoresist dissolution
Lewis W. Flanagin, Vivek K. Singh, C. Grant Willson · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 62 citations
Natural Sciences, Materials Engineering, Materials Science +17