Quarter-micron gate length microwave high electron mobility transistor

P.C. Chao, T. Yu, P.M. Smith, S. Wanuga, James C. M. Hwang, William H. Perkins, H. Lee, L.F. Eastman, E. D. Wolf

Electronics Letters · 1983 · 15 citations · 0 references

Concepts

Abstract

Quarter-micron gate length high electron mobility transistors have been fabricated using an electron-beam direct-writing technique. A maximum stable gain of 10 dB at 18 GHz has been measured at room temperature. A room-temperature cutoff frequency fT as high as 45 GHz has also been obtained.