Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source - Concepedia

Concepedia

Publication | Closed Access

Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source

10

Citations

7

References

2000

Year

Masaru Shimada, Takao Amazawa, Takahito Ono, S. Matsuo, Hideo Oikawa

Materials ScienceAluminium NitridePlasma ElectronicsEngineeringPhysicsUltrathin Al2o3Surface ScienceApplied PhysicsThin FilmsReactive SputterChemical DepositionPlasma ProcessingAln Films

References

	Year	Citations

Page 1

Page 1