Evaluation of Self-Patterned PbZr_xTi_1-xO₃ Thin Film from Photosensitive Solution

Abstract

Micro-patterned PZT(20/80) films were fabricated on Pt/Ti/SiO 2 /Si substrate from a photosensitive solution by the sol-gel process. A coated film was exposed to UV rays (365 nm) at an intensity of 570 mJ/cm 2 and developed with a 1:1 mixture of 2-methoxyethanol and isopropyl alcohol. The 170-nm-thick film with a smooth surface showed P r of 31.9 µC/cm 2 and E c of 120.8 kV/cm. Films with smoother surface morphology and better electrical properties than conventional PZT films were obtained by this process.