Micro-Patterning of PbZr_xTi_1-xO₃ Thin Films Prepared by Photo Sensitive Sol-Gel Solution

Abstract

The photo sensitivity of sol-gel solution of PbZr x Ti 1- x O 3 (PZT) was studied. A coated film of the sol-gel solution on Pt/Ti/SiO 2 /Si substrates was exposed to an excimer laser and developed with water. The film was finally annealed at 700°C for 60 s by rapid thermal annealing (RTA). Ferroelectric perovskite phase was observed in the PZT thin films. The 130-nm-thick film showed P r of 11.2 µ C/cm 2 and E c of 93.8 kV/cm. From this process, half-micron patterns of PZT films were obtained.