Concepedia
Chemical Engineering Science · 1988 · 14 citations · 8 references
EngineeringMaterials EngineeringMaterials ScienceNuclear MaterialsSemiconductor DevicesSemiconductor MaterialsEpitaxial GrowthSemiconductor Crystal GrowthSilicon MaterialsEpitaxial Film GrowthSilicon Crystal GrowthSilicon Epitaxy
8
Chemical Vapor Deposition: A Chemical Engineering Perspective
Dennis W. Hess, Klavs F. Jensen, Timothy J. Anderson · Reviews in Chemical Engineering · 1985 · 90 citations
Natural Sciences, Chemical Engineering, Chemistry +12
Growth and etching of silicon in chemical vapour deposition systems; The influence of thermal diffusion and temperature gradient
P. van der Putte, L.J. Giling, J. Bloem · Journal of Crystal Growth · 1975 · 70 citations
Engineering, Materials Engineering, Materials Science +16
Selective Silicon Epitaxy Using Reduced Pressure Technique
Kohetsu Tanno, Nobuhiro Endo, Hiroshi Kitajima et al. · Japanese Journal of Applied Physics · 1982 · 66 citations
Thermal Diffusion Effects in Chemical Vapor Deposition Reactors
Joel P. Jenkinson, Richard Pollard · Journal of The Electrochemical Society · 1984 · 64 citations
Engineering, Chemical Engineering, Chemistry +17
Local Loading Effect in Selective Silicon Epitaxy
Akihiko Ishitani, Nobuhiro Endo, Hideki Tsuya · Japanese Journal of Applied Physics · 1984 · 46 citations
Engineering, Materials Science, Electronic Materials +11