Kohetsu Tanno

Selective Silicon Epitaxy Using Reduced Pressure Technique

Kohetsu Tanno, Nobuhiro Endo, Hiroshi Kitajima et al. · Japanese Journal of Applied Physics · 1982 · 66 citations

Sih 2, Electrical Engineering, Epitaxial Growth +10

Selective silicon epitaxial growth for device-isolation technology

Akihiko Ishitani, Hiroshi Kitajima, Kohetsu Tanno et al. · Microelectronic Engineering · 1986 · 52 citations

Electrical Engineering, Engineering, Applied Physics +4

Crystalline Defects in Selectively Epitaxial Silicon Layers

Hiroshi Kitajima, Akihiko Ishitani, Nobuhiro Endo et al. · Japanese Journal of Applied Physics · 1983 · 28 citations

Electrical Engineering, Engineering, Crystalline Defects +9

Novel device isolation technology with selective epitaxial growth

Nobuhiro Endo, Kohetsu Tanno, Akihiko Ishitani et al. · IEEE Transactions on Electron Devices · 1984 · 20 citations

Electrical Engineering, Epitaxial Growth, Selective Epitaxial Growth +10

Novel device isolation technology with selective epitaxial growth

Nobuhiro Endo, Kohetsu Tanno, Akihiko Ishitani et al. · 1982 · 18 citations

Bulk Silicon Surface, Electrical Engineering, Epitaxial Growth +8