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Persistent photoconductivity in Hf–In–Zn–O thin film transistors
155
Citations
21
References
2010
Year
SemiconductorsOxygen VacancyElectrical EngineeringElectronic DevicesVisible Light StressEngineeringSemiconductor TechnologyPhotoluminescenceOxide ElectronicsOptoelectronic MaterialsApplied PhysicsPersistent PhotoconductivityPhotoelectric MeasurementOptoelectronic DevicesThin FilmsOptoelectronicsCompound SemiconductorSemiconductor Device
Passivated Hf–In–Zn–O (HIZO) thin film transistors suffer from a negative threshold voltage shift under visible light stress due to persistent photoconductivity (PPC). Ionization of oxygen vacancy sites is identified as the origin of the PPC following observations of its temperature- and wavelength-dependence. This is further corroborated by the photoluminescence spectrum of the HIZO. We also show that the gate voltage can control the decay of PPC in the dark, giving rise to a memory action.
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