Journal of Applied Physics · 1986 · 64 citations · 13 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsChemical Vapor DepositionIii-v SemiconductorsSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor PhysicsWide Band Gap SemiconductorsBarrier HeightsCurrent-voltage RelationsEffective MassElectronic Band GapMetalorganic Chemical Vapor DepositionTunneling BarriersTunneling CurrentTunneling Phenomena
Current–voltage characteristics of GaAs/AlxGa1−xAs /GaAs heterobarriers grown by metalorganic chemical vapor deposition were investigated for x from 0.32 to 0.46. Calculation of the current, which included just two components—a tunneling component and a thermionic component—agreed well with experimental results. The tunneling effective mass used is the same as the Γ point effective mass when x is 0.32; this value allows the calculated results to fit the experimental data. The tunneling effective mass becomes much larger than the Γ point mass as x increases. This fact suggests that the other band edge X participates in the tunneling process, making the effective mass larger as it approaches the Γ point edge. The barrier heights deduced from I–V and I–T relations are in good agreement. The results support a ratio of 60%–65% of AlGaAs/GaAs conduction-band discontinuity to the total band-gap difference.
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H. C. Casey, M. B. Panish, T. A. Roth · Journal of The Electrochemical Society · 1979 · 1.7K citations
C. B. Duke, John Lambe · Physics Today · 1973 · 546 citations
A GaAs gate heterojunction FET
P. M. Solomon, C. M. Knoedler, Steven L. Wright · IEEE Electron Device Letters · 1984 · 116 citations