Ordered Arrays of Nanopillars Formed by Photoelectrochemical Etching on Directly Imprinted TiO₂ Single Crystals

Abstract

Arrays of TiO 2 nanopillars have been prepared by photochemically etching a TiO 2 single crystal that had been previously imprinted with a corresponding array of dimples using SiC molds. The pillars have a high aspect ratio (see scanning electron microscopy (SEM) image in Figure) and the method is simple and suitable for high‐throughput production.