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New TiO<sub>x</sub>-MIS and Si0<sub>2</sub>-MIS silicon solar cells
36
Citations
4
References
1978
Year
EngineeringNew TypesPhotovoltaic DevicesPhotovoltaic SystemPhotovoltaicsSemiconductorsSolar Cell StructuresSolar Thermal EnergySolar Energy UtilisationMaterials ScienceSolar Physics (Heliophysics)Electrical EngineeringThin-film FabricationTitanium-oxide Antireflective CoatingSemiconductor Device FabricationAnti-reflective CoatingsSolar Physics (Solar Energy Conversion)Surface ScienceApplied PhysicsThin FilmsSolar CellsSolar Cell Materials
Two new types of solar cells are described in which either a TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</inf> or a SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> layer is deposited onto p silicon; contacts are obtained by means of a MIS tunnel diode grid. It is shown that the TiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</inf> -MIS cells can be realized by single-mask completely low-temperature processing by employing spin-on of titanium-oxide antireflective coating. Conversion efficiencies of 8 percent at AM1 have been achieved with these cells; they perform even more efficiently at higher illumination levels. With the SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> -MIS cells efficiencies of 12 percent have been reached, at the expense of a slightly more complicated process. A detailed comparison between the two cells is given.
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