Publication | Closed Access
An AlN/GaN insulated gate heterostructure field effect transistor with regrown n+GaN source and drain contact
19
Citations
7
References
1998
Year
Wide-bandgap SemiconductorElectrical EngineeringEngineeringApplied PhysicsAluminum Gallium NitrideGan Power DeviceDrain ContactRegrown N+gan SourceSemiconductor Device
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