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Current image tunneling spectroscopy of boron-doped nanodiamonds
15
Citations
15
References
2005
Year
EngineeringSemiconductor NanostructuresSemiconductorsBoron NitrideElectronic DevicesTunneling MicroscopyHexagonal Boron NitrideNanoelectronicsNanodiamond FilmsImpurity StatesNanometrologyNanoscale SciencePhysicsCrystalline DefectsNanotechnologyField Emission PropertiesNatural SciencesSpectroscopyApplied PhysicsCurrent Image
The electron field emission properties of the nanodiamond films were examined using scanning tunneling microscopic (STM) technique. Current image tunneling spectroscopic measurements reveal the direct dependence of electron tunneling/field emission behavior of the films on the proportion of grain boundaries present. Local tunneling current-voltage (It–V) measurements show that incorporation of boron species insignificantly alters the occupied state, but markedly modifies the empty state of the diamond films, viz. it induces the presence of impurity states for the films heavily doped with borons, resulting in smaller emission energy gap for the samples. Such a characteristic improves both the local electron field emission behavior of the diamond films measured by STM and the average electron field emission properties measured by conventional parallel plate setup. These results infer clearly that the presence of impurity states due to boron doping is a prime factor improving the field emission properties for these boron-doped nanodiamond films.
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