Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)

Abstract

The synthesis and properties of noria derivatives containing oxetanyl groups were investigated for their application as negative-type extreme ultraviolet (EUV) resist materials. The solubility, film-forming ability, and photochemical reactivity were consistent with the structures of noria derivatives. The patterning properties of the synthesized noria derivatives were also examined using an EUV system, and patterns with 45 and 50 nm half-pitch resolution were obtained.