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Defects in Eu- and Tb-doped GaN probed using a monoenergetic positron beam
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Citations
21
References
2003
Year
Materials ScienceWide-bandgap SemiconductorEngineeringPhysicsNanoelectronicsApplied PhysicsCondensed Matter PhysicsMonoenergetic Positron BeamAluminum Gallium NitrideGan Power DeviceGallium OxideHost MatrixTb-doped Gan FilmsCategoryiii-v SemiconductorTb-doped GanOptoelectronicsGan Film
We probed defects in Eu- and Tb-doped GaN films grown on sapphire substrates by gas-source molecular-beam epitaxy with a monoenergetic positron beam. In both Eu- and Tb-doped samples, we observed vacancy clusters consisting of two or more vacancies. These defects were introduced by replacing Ga with rare-earth elements, and resulting in distortion of the host matrix. We studied the correlation between luminescence originating from the intra-4f-transitions of Eu3+ and the crystal quality of the GaN film. In film doped at 2-at. % Eu, the mean open volume of the vacancies near the interface between the GaN film and the sapphire substrate was found to be larger than that in the subsurface region. The increase in the open volume of the defects correlated with the lowering coordination symmetry of Eu3+ and the increase in the transition rate of its 4f-electrons.
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