Focused ion beam lithography and its application to submicron devices

Ion Beam Exposure of Resist Materials

Masanori Komuro, Nobufumi Atoda, Hisazo Kawakatsu · Journal of The Electrochemical Society · 1979 · 78 citations

Natural Sciences, Materials Engineering, Materials Science +16

Ion beam exposure profiles in PMMA–computer simulation

L. Karapiperis, I. Adesida, C. A. Lee et al. · Journal of Vacuum Science and Technology · 1981 · 63 citations

Engineering, Materials Engineering, Materials Science +11

Maskless etching of a nanometer structure by focused ion beams

Masanori Komuro, Hiroshi Hiroshima, H. Tanoue et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1983 · 61 citations

Engineering, Mechanical Engineering, Radiation Dosimetry +11

High resolution patterning of silicon by selective gallium doping

Ivan L. Berry, A.L. Caviglia · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1983 · 51 citations

Engineering, Materials Engineering, Materials Science +17

High resolution sputtering using a focused ion beam

R. L. Kubena, R. L. Seliger, E.H. Stevens · Thin Solid Films · 1982 · 39 citations

Natural Sciences, Materials Science, Physics +7