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Near-unity below-band-gap absorption by microstructured silicon
508
Citations
15
References
2001
Year
Short Wavelength OpticOptical MaterialsEngineeringLaser ApplicationsOptoelectronic DevicesIntegrated CircuitsSilicon On InsulatorSemiconductorsOptical PropertiesMicrostructured SiliconNanophotonicsMaterials SciencePhotoluminescencePhysicsInfrared PhotodetectorsOptoelectronic MaterialsSemiconductor MaterialSemiconductor Device FabricationPhotonic DeviceApplied PhysicsLight AbsorptionSurface TexturingOptoelectronicsMicrostructured Avalanche Photodiodes
We increased the absorptance of light by silicon to approximately 90% from the near ultraviolet (0.25 μm) to the near infrared (2.5 μm) by surface microstructuring using laser-chemical etching. The remarkable absorptance most likely comes from a high density of impurities and structural defects in the silicon lattice, enhanced by surface texturing. Microstructured avalanche photodiodes show significant enhancement of below-band-gap photocurrent generation at 1.06 and 1.31 μm, indicating promise for use in infrared photodetectors.
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