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A new water-soluble photoresist used a polymeric azide compound as a photosensitizer.

DOIFull Paper Access

11

Citations

0

References

1994

Year

Hajime Morishita, Masato Ito, Nobuaki Hayashi, Saburo Nonogaki, Yoshiyuki Odaka, Masahiro Nishizawa
Journal of Photopolymer Science and Technology

Abstract

A new water-soluble photoresist consisting of a polymeric azide sensitizer and Poly(acrylamide-diacetone acrylamide) (PAD) was developed for this potential application to a black matrix process in a color picture tube fabrication. The polymeric azide sensitizer was prepared by the condensation reaction of Poly(4-vinylacetophenone-malefic acid) with 4azidobenzaldehyde-2-sodium salt. This newly developed resist shows higher sensitivity than that of our current resist that is composed of 4, 4' -diazidostilbene-2, 2' -disulfonate and PAD. The resist exhibits the reciprocity-law failing characteristic that is desirable for high contrast patterning. One of the mechanisms of increase in sensitivity is presumed to be due to the tangle of polymers between a polymeric azide sensitizer and PAD.