Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system

Principles of Plasma Diagnostics

S. J. Zweben · Fusion Technology · 1990 · 372 citations

Additional Informationnotes, Engineering, Physics +12

Pulsed magnetron sputter technology

S. Schiller, K. Goedicke, J. Reschke et al. · Surface and Coatings Technology · 1993 · 334 citations

Magnetism, Engineering, Applied Physics +4

Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma

James W. Bradley, H. Bäcker, Peter Kelly et al. · Surface and Coatings Technology · 2001 · 135 citations · Full text

Substrate Position, Engineering, Physics +8

Influence of the plasma on substrate heating during low-frequency reactive sputtering of AIN

David A. Glocker · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 100 citations

Materials Engineering, Electrical Engineering, Engineering +14

The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering

Peter Kelly, O.A. Abuzeid, R.D. Arnell et al. · Surface and Coatings Technology · 1996 · 81 citations

Materials Engineering, Materials Science, Thermal Spray Coating +7