A Novel Super-Resolution Technique for Optical Lithography–Nonlinear Multiple Exposure Method

Abstract

A novel method for optical lithography using a resist with nonlinear photosensitivity and the multiple exposure technique is described. By means of this method, the diffraction-limited optical cutoff frequency is raised markedly, which cannot be realized by any of the other methods proposed previously. A brief explanation of the principle is given and computer simulations are demonstrated.