A new chemical etch for defects studies in very thin film (< 1000 Å) SIMOX material - Concepedia

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A new chemical etch for defects studies in very thin film (< 1000 Å) SIMOX material

17

Citations

6

References

1993

Year

L.F. Giles, A. Nejim, P.L.F. Hemment

Materials Chemistry and Physics

Materials ScienceMaterials EngineeringChemical EngineeringMaterial AnalysisEngineeringSurface ScienceApplied PhysicsNew Chemical EtchThin FilmsPlasma EtchingChemical Vapor DepositionThin Film ProcessingSimox Material

References

	Year	Citations

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