Achievement of a near-perfect smooth silicon surface

Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers

H. Seidel, L. Csepregi, A. Heuberger et al. · Journal of The Electrochemical Society · 1990 · 1.6K citations

Natural Sciences, Materials Engineering, Materials Science +17

Effects of particle size, polishing pad and contact pressure in free abrasive polishing

Yongsong Xie, Bharat Bhushan · Wear · 1996 · 231 citations

Engineering, Materials Engineering, Materials Science +16

Dimensional metrology with scanning probe microscopes

J. E. Griffith, D. A. Grigg · Journal of Applied Physics · 1993 · 175 citations

Engineering, Materials Engineering, Materials Science +16

Polishing pad surface characterisation in chemical mechanical planarisation

John McGrath, Chris Davis · Journal of Materials Processing Technology · 2004 · 130 citations

Engineering, Materials Engineering, Materials Science +11

Silicon roughness induced by plasma etching

R. Petri, Pascal Brault, O. Vatel et al. · Journal of Applied Physics · 1994 · 106 citations

Natural Sciences, Materials Science, Physics +15