GaAs/GaAlAs distributed Bragg reflector laser with a focused ion beam, low dose dopant implanted grating

Ming C. Wu, M.M. Boenke, Shih-Yuan Wang, William M. Clark, E.H. Stevens, M. Utlaut

Applied Physics Letters · 1988 · 15 citations · 13 references

Concepts

Abstract

We report for the first time, the performance of a GaAs/GaAlAs distributed Bragg reflector (DBR) laser using a focused ion beam implanted grating (FIB-DBR). Stripes of Si++ with a period of 2300 Å and a dose ∼1014 cm−2 are directly implanted into the passive large optical cavity layer to provide the distributed feedback. Surface-emitting light from the second-order grating is observed. Threshold current of 110 mA and single DBR mode operation from 20 to 40 °C are obtained. The wavelength tuning rate with temperature is 0.8 Å/°C. The coupling coefficient is estimated to be 15 cm−1. The results show that FIB technology is practical for distributed feedback and DBR lasers and optoelectronic integrated circuits.

References

13