Correlation Between Processing and Properties of Titanium Oxycarbide, TiCxOy, Thin Films

Abstract

The main purpose of this work was to prepare of single layered TiCxOy thin films. The depositions were carried out from a TiC target by DC reactive magnetron sputtering, varying the oxygen flow. The presence of oxygen changes the film properties between those of titanium carbide and those of the corresponding titanium oxide. X-Ray diffraction (XRD) results revealed the occurrence of a face-centered cubic (TiC-type) phase, with a clear tendency toward amorphization at the highest oxygen contents. Chemical and structural features strongly influence the film properties, which were analyzed in detail as a function of the preparation conditions. Results indicate a systematic increase in resistivity and a decrease in hardness with the increase in the film's oxygen content.