Size control of silicon nanocrystals in silicon nitride film deposited by catalytic chemical vapor deposition at a low temperature (⩽200 °C)

Kyoung‐Min Lee, Taehwan Kim, Jae‐Dam Hwang, Seunghun Jang, Kiyoung Jeong, Moonsup Han, Sunghwan Won, Junghyun Sok, Kyoungwan Park, Wan‐Shick Hong

Scripta Materialia · 2009 · 13 citations · 8 references

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