GaInAsP/InP DH lasers with a chemically etched facet

Kenichi Iga, M. Pollack, B.I. Miller, R. Douglas Martin

IEEE Journal of Quantum Electronics · 1980 · 12 citations · 10 references

Concepts

Abstract

We describe a new configuration and novel fabrication method for GaInAsP/InP DH lasers in which one of the facet mirrors is chemically etched and the other one is formed by cleaving. The etched facet is fabricated monolithically by wet chemical etching in a solution of HCl:CH <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> COOH:H <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> O <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> = (1:2:1). Broad-area contact lasers of this type operating at room temperature at a wavelength of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">\sim 1.3 \mu</tex> m have been demonstrated.

References

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