Mechanism of porous low-k film damage induced by plasma etching radicals - Concepedia

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Mechanism of porous low-k film damage induced by plasma etching radicals

32

Citations

9

References

2009

Year

Yoshihisa Iba, Shiro Ozaki, Makoto Sasaki, Yasushi Kobayashi, Tomoyuki Kirimura, Yoshihiro Nakata

Microelectronic Engineering

Materials ScienceEngineeringSurface ScienceApplied PhysicsPlasma Etching RadicalsGas Discharge PlasmaNonthermal PlasmaMicroelectronicsPlasma EtchingPlasma ProcessingPlasma Application

References

	Year	Citations

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