Concepedia

Tomoyuki Kirimura

TK

Statistics

Publications

4

Citations

103

H-Index

4

Active since

2006

Affiliations

Fujitsu (Japan)(Current)

Tomoyuki Kirimura is an author at Fujitsu (Japan) specializing in materials science, natural sciences, and materials engineering.

Publications per year

2006–2014

4

Publications

4

Mechanism of porous low-k film damage induced by plasma etching radicals

Yoshihisa Iba, Shiro Ozaki, Makoto Sasaki et al. · Microelectronic Engineering · 2009 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +14

Acoustic Pulse Echoes Probed with Time-Resolved X-Ray Triple-Crystal Diffractometry

Yujiro Hayashi, Yoshihito Tanaka, Tomoyuki Kirimura et al. · Physical Review Letters · 2006 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effects of Etch Rate on Plasma-Induced Damage to Porous Low-k Films

Yoshihisa Iba, Tomoyuki Kirimura, Makoto Sasaki et al. · Japanese Journal of Applied Physics · 2008 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +17

<i>In-situ</i> scanning electron microscope observation of electromigration-induced void growth in 30 nm ½ pitch Cu interconnect structures

Kris Vanstreels, P. Czarnecki, Tomoyuki Kirimura et al. · Journal of Applied Physics · 2014 · 13 citations

Engineering, Electrical Engineering, Materials Science +17

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