The electrodeposition of cobalt–nickel–iron high aspect ratio thick film structures for magnetic MEMS applications

A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity

Tetsuya Ōsaka, Madoka Takai, Katsuyoshi Hayashi et al. · Nature · 1998 · 380 citations

Natural Sciences, Materials Engineering, Materials Science +16

Electrodeposition of highly functional thin films for magnetic recording devices of the next century

Tetsuya Ōsaka · Electrochimica Acta · 2000 · 179 citations

Natural Sciences, Materials Engineering, Materials Science +14

Micromachined planar inductors on silicon wafers for MEMS applications

Chang-Geun Ahn, Mark G. Allen · IEEE Transactions on Industrial Electronics · 1998 · 178 citations

Engineering, Electrical Engineering, Microelectromechanical Systems +15

Magnetic MEMS: key issues and some applications

D. Niarchos · Sensors and Actuators A Physical · 2003 · 151 citations

Engineering, Electrical Engineering, Materials Science +9

Structural and Magnetic Characterization of Electrodeposited, High Moment FeCoNi Films

Xiaomin Liu, Giovanni Zangari, Mohammed Shamsuzzoha · Journal of The Electrochemical Society · 2003 · 76 citations

Natural Sciences, Materials Engineering, Materials Science +17