Yelena Sverdlov

Characterization of electroless deposited Co(W,P) thin films for encapsulation of copper metallization

A. Köhn, M. Eizenberg, Yosi Shacham‐Diamand et al. · Materials Science and Engineering A · 2001 · 109 citations

Materials Science, Engineering, Surface Electrochemistry +5

Electroless processes for micro- and nanoelectronics

Yosi Shacham‐Diamand, Alexandra Inberg, Yelena Sverdlov et al. · Electrochimica Acta · 2003 · 84 citations

Electrical Engineering, Engineering, Nanoelectronics +5

Electroless Silver and Silver with Tungsten Thin Films for Microelectronics and Microelectromechanical System Applications

Yosi Shacham‐Diamand, Alexandra Inberg, Yelena Sverdlov et al. · Journal of The Electrochemical Society · 2000 · 77 citations

Engineering, Ag Thin Films, Tungsten Thin Films +19

Electrochemically deposited thin film alloys for ULSI and MEMS applications

Yosi Shacham‐Diamand, Yelena Sverdlov · Microelectronic Engineering · 2000 · 73 citations

Materials Science, Electrical Engineering, Engineering +9

Evaluation of electroless deposited Co(W,P) thin films as diffusion barriers for copper metallization

A. Kohn, M. Eizenberg, Yosi Shacham‐Diamand et al. · Microelectronic Engineering · 2001 · 65 citations

Materials Science, Diffusion Barriers, Electromigration Technique +8