Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices - Concepedia

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Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

148

Citations

26

References

2004

Year

Giovanni Isella, Daniel Chrastina, B. Rössner, T. Hackbarth, H.-J. Herzog, U. König, H. von Känel

Solid-State Electronics

EngineeringApplied PhysicsSemiconductor Device FabricationGe HeterostructuresSilicon On InsulatorChemical Vapor DepositionStrained SiSemiconductor Device

References

	Year	Citations

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