B. Rössner

Field-effect-modulated Seebeck coefficient in organic semiconductors

Kurt P. Pernstich, B. Rössner, B. Batlogg · Nature Materials · 2008 · 217 citations

Semiconductors, Organic Charge-transfer Compound, Engineering +5

Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

Giovanni Isella, Daniel Chrastina, B. Rössner et al. · Solid-State Electronics · 2004 · 148 citations

Engineering, Applied Physics, Semiconductor Device Fabrication +5

Scattering mechanisms in high-mobility strained Ge channels

B. Rössner, Daniel Chrastina, Giovanni Isella et al. · Applied Physics Letters · 2004 · 95 citations · Full text

Semiconductors, Ge Layers, Semiconductor Technology +13

High mobility SiGe heterostructures fabricated by low-energy plasma-enhanced chemical vapor deposition

H. von Känel, Daniel Chrastina, B. Rössner et al. · Microelectronic Engineering · 2004 · 25 citations

Electrical Engineering, Engineering, Applied Physics +4

Thin relaxed SiGe virtual substrates grown by low-energy plasma-enhanced chemical vapor deposition

Daniel Chrastina, Giovanni Isella, Monica Bollani et al. · Journal of Crystal Growth · 2005 · 12 citations

Engineering, Physics, Microfabrication +10