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Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules
344
Citations
11
References
2007
Year
Materials ScienceElectrical EngineeringElectronic DevicesEngineeringOxide ElectronicsSurface ScienceApplied PhysicsVon ShiftsFilm SurfaceGallium OxideThin Film Process TechnologyThin FilmsAmorphous SolidThin Film TransistorsAmbient AirThin Film ProcessingSemiconductor Device
In this study, the authors report characteristic of indium gallium zinc oxides (GIZOs) which is strongly associated with the film surface. In ambient air, turn-on voltage of GIZO thin film transistors is approximately −7V. However, at the pressure of 8×10−6Torr, the turn-on voltage dramatically shifts to nearly −47V of the negative gate bias direction. When the oxygen is introduced in the chamber, the turn-on voltage returns to the normal value, that of air. It is believed that the adsorbed oxygen forms depletion layer below the surface, resulting in Von shifts. The carrier concentration of the channel varies from 1×1019to1×1020cm−3 due to oxygen adsorption.
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