<title>Micromachining of ultrananocrystalline diamond</title>

Nicolai A. Moldovan, Orlando Auciello, Anirudha V. Sumant, John A. Carlisle, Ralu Divan, D. M. Gruen, A.R. Krauss, Derrick C. Mancini, Ahalapitiya H. Jayatissa, John C. Tucek

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 11 citations · 0 references

Concepts

Abstract

Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2 - 5 nm is produced using a microwave plasma chemical vapor deposition process with argon-rich C<SUB>60</SUB> or CH<SUB>4</SUB> plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (approximately 0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO<SUB>2</SUB> sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.