Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films

Abstract

Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition. The data suggest that the structure of the a-CFx is mostly of carbon rings connected by CF2 groups. The cross linking increases with substrate temperature.