Very low defect remote hydrogen plasma clean of Si (100) for homoepitaxy - Concepedia

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Very low defect remote hydrogen plasma clean of Si (100) for homoepitaxy

47

Citations

13

References

1990

Year

B. Anthony, Tsan‐sheng Hsu, L. Breaux, Ruizhe Qian, Sanjay K. Banerjee, A.F. Tasch

Journal of Electronic Materials

Materials EngineeringElectrical EngineeringEngineeringApplied PhysicsSemiconductor Device FabricationHydrogenNonthermal PlasmaPlasma ProcessingSilicon On Insulator

References

	Year	Citations

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