Concepedia

Planarization of aluminum alloy film during high rate sputtering

V. Hoffman, J. Griswold, D. Mintz, D. J. Harra

Thin Solid Films · 1987 · 17 citations · 6 references

DOI

Concepts

References

6

Flattening of a Nearly Plane Solid Surface due to Capillarity

W. W. Mullins · Journal of Applied Physics · 1959 · 895 citations

, , +17

Planar Deposition of Aluminum by RF/DC Sputtering with RF Bias

Yoshio Homma, Sukeyoshi Tsunekawa · Journal of The Electrochemical Society · 1985 · 75 citations

, , +13

Significant improvement in step coverage using bias sputtered aluminum

D. W. Skelly, Lothar A. Gruenke · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 43 citations

, , +13

Influences of D.C. bias on aluminum films prepared with a high rate magnetron sputtering cathode

Y.H. Park, F.T. Zold, James F. Smith · Thin Solid Films · 1985 · 21 citations

, , +15

Effects of substrate temperature on copper distribution, resistivity, and microstructure in magnetron-sputtered Al-Cu films

K. Y. Ahn, Tianyi Lin, Peter Madakson et al. · Thin Solid Films · 1987 · 13 citations

, , +15