Argon ion etching in a reactive gas

Handbook of Thin Film Technology

L. I. Maissel, R. Glang, Paul P. Budenstein · Journal of The Electrochemical Society · 1971 · 2.8K citations

Natural Sciences, Materials Engineering, Materials Science +12

Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev

N. Laegreid, G. K. Wehner · Journal of Applied Physics · 1961 · 807 citations

Natural Sciences, Materials Science, Physics +13

High-resolution Positive Resists for Electron-beam Exposure

Istvan Haller, M. Hatzakis, R. Srinivasan · IBM Journal of Research and Development · 1968 · 177 citations

Engineering, Electrical Engineering, Materials Science +13

Cesium-Ion Bombardment of Aluminum Oxide in a Controlled Oxygen Environment

E. H. Hasseltine, F. C. Hurlbut, N. Thomas Olson et al. · Journal of Applied Physics · 1967 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +14

Cesium Ion Sputtering of Aluminum

A. E. Andrews, E. H. Hasseltine, N. Thomas Olson et al. · Journal of Applied Physics · 1966 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +15