High resolution atomic force microscopy potentiometry

Jonathan Weaver, David W. Abraham

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 404 citations · 0 references

Concepts

Abstract

A method is presented for performing attractive-mode force potentiometry with submillivolt accuracy and a typical spatial resolution of order 50 nm. The technique permits measurements to be made in air on specimens which may be passivated or oxidized, conducting or semiconducting, with virtually no sensitivity to oxide thickness or character. An initial demonstration is presented showing voltage measurements on a commercial operational amplifier.