Publication | Closed Access
Photoemission yield under two-quantum excitation in Si
26
Citations
9
References
1981
Year
PhotonicsQuantum ScienceFlux ProportionalEngineeringPhotoluminescencePhysicsCharacteristic Flux LawTwo-quantum ExcitationApplied PhysicsAtomic PhysicsPhotoelectric MeasurementLaser ExcitationOptoelectronics
It is shown for the first time that under pulsed laser excitation, photoemission from cleaned (7\ifmmode\times\else\texttimes\fi{}7) Si (111) surfaces occurs at photon energies (3.7 to 2.3 eV) below the work function ($\ensuremath{\varphi}=4.6$ eV). We demonstrate its two-quantum origin by: (i) establishing the characteristic flux law, i.e., electron flux proportional to the square of photon flux, over six orders of magnitude; (ii) showing that the two-quantum yield falls very rapidly when photon energy decreases, no photoemission being observed below $\frac{1}{2}\ensuremath{\varphi}$.
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