Characteristics of TiOx films prepared by chemical vapor deposition using tetrakis-dimethyl-amido-titanium and water

Ferroelectric Memories

J. F. Scott, Carlos A. Paz de Araújo · Science · 1989 · 3.8K citations

Natural Sciences, Electrical Engineering, Materials Science +17

Photoelectrocatalytic reduction of carbon dioxide in aqueous suspensions of semiconductor powders

Tooru Inoue, Akira Fujishima, Satoshi Konishi et al. · Nature · 1979 · 2.9K citations

Natural Sciences, Chemical Engineering, Chemistry +16

Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

Dennis M. Hausmann, Esther Kim, Jill Becker et al. · Chemistry of Materials · 2002 · 528 citations

Natural Sciences, Materials Engineering, Materials Science +14

Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Mikko Ritala, Markku Leskelä, Lauri Niinistö et al. · Chemistry of Materials · 1993 · 295 citations

Natural Sciences, Chemistry, Materials Science +8

Formation of TiO₂ and ZrO₂ Nanotubes Using Atomic Layer Deposition with Ultraprecise Control of the Wall Thickness

Hyunsu Shin, Daekyun Jeong, Jaegab Lee et al. · Advanced Materials · 2004 · 257 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17