Publication | Closed Access
Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry
41
Citations
14
References
1998
Year
Real-time MonitoringElectrical EngineeringProduction EnvironmentEngineeringSpectroscopyApplied PhysicsSemiconductor Device FabricationMolecular Beam EpitaxyEpitaxial GrowthOptoelectronicsCompound SemiconductorEpitaxial Semiconductor Growth
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